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XRF (X Ray Fluorescence)
X-ray Fluorescence (XRF)
X-ray Fluorescence (XRF) is a non-destructive technique that is used to quantify the elemental composition of solid and liquid samples. X-rays are used to excite atoms in the sample, causing them to emit x-rays with energies characteristic of each element present. The intensity and energy of these x-rays are then measured. XRF is capable of detecting elements from Na-U in concentrations from PPM range to 100%. Because X-rays are used to excite the sample depths as great as 10µm can be analyzed. Through the use of appropriate reference standards, XRF can accurately quantify the elemental composition of both solid and liquid samples.
XRF Technical Capabilities
Signal Detected:
X-rays
Elements Detected:
Na-U
Detection Limits:
10 ppm
Imaging/Mapping:
No
Lateral Resolution/Probe Size:
100 µm
Ideal Uses for XRF Analysis
- Measuring metal film thickness up to several microns
- Full wafer mapping (up to 300mm wafers) of film thickness with high precision and accuracy
- Elemental identification in unknown solids, liquids, and powders
- Identification of metal alloys
Relevant Industries for XRF Analysis
- Aerospace
- Automotive
- Data Storage
- Defense
- Electronics
- Industrial Products
- Lighting
- Polymer
- Semiconductor
Strengths of XRF Analysis
- Non-destructive
- Whole wafer analysis (200 and 300 nm) as well as wafer pieces and small samples
- Mapping of full wafers
- No sample preparation requirements
- Can analyze areas as small as 30µm
- Can analyze liquids and solids
- Sampling depth as great as 10µm
Limitations of XRF Analysis
- Cannot detect elements lighter than Al
- For high accuracy requires reference standards similar to test sample
- No depth profiling capability